supported by the National Key R&D Plan“Nano Frontier”Key Special Project(Grant No.2021YFA1200502);Cultivation Projects of National Major R&D Project(Grant No.92164109);the National Natural Science Foundation of China(Grant Nos.61874158,62004056,and 62104058);the Special Project of Strategic Leading Science and Technology of Chinese Academy of Sciences(Grant No.XDB44000000-7);Key R&D Plan Projects in Hebei Province(Grant No.22311101D);Hebei Basic Research Special Key Project(Grant No.F2021201045);the Support Program for the Top Young Talents of Hebei Province(Grant No.70280011807);the Supporting Plan for 100 Excellent Innovative Talents in Colleges and Universities of Hebei Province(Grant No.SLRC2019018);the Interdisciplinary Research Program of Natural Science of Hebei University(No.DXK202101);the Institute of Life Sciences and Green Development(No.521100311);the Natural Science Foundation of Hebei Province(Nos.F2022201054 and F2021201022);the Outstanding Young Scientific Research and Innovation Team of Hebei University(Grant No.605020521001);the Special Support Funds for National High Level Talents(Grant No.041500120001);the Advanced Talents Incubation Program of the Hebei University(Grant Nos.521000981426,521100221071,and 521000981363);the Science and Technology Project of Hebei Education Department(Grant Nos.QN2020178 and QN2021026).
The intrinsic variability of memristor switching behavior can be used as a natural source of randomness,this variability is valuable for safe applications in hardware,such as the true random number generator(TRNG).How...
financially supported by the National Key Research and Development Program of China(Grant No.2020YFB2008501);Huawei Technologies Co.,Ltd.
Low-temperature silicon nitride(SiNx)films deposited by plasma-enhanced chemical vapor deposition(PECVD)have huge application potential in the flexible display.However,the applicability of SiNx largely depends on the ...
Project supported by the National Key Research and Development Program,China(Grant No.2017YFB0402800);the Key Research and Development Program of Guangdong Province,China(Grant Nos.2019B010128002 and 2020B010173001);the National Natural Science Foundation of China(Grant No.U1601210);the Natural Science Foundation of Guangdong Province,China(Grant No.2015A030312011);the Open Project of Key Laboratory of Microelectronic Devices and Integrated Technology(Grant No.202006);the Science and Technology Plan of Guangdong Province,China(Grant No.2017B010112002);the China Postdoctoral Science Foundation(Grant No.2019M663233).
Stress voltages on time-dependent breakdown characteristics of GaN MIS-HEMTs during negative gate bias stress (with VGS < 0, VD = VS = 0) and off-state stress (VG < VTh, VDS > 0, VS = 0) are investigated. For negative...