IMEC’s industry affiliation R&D program,National Research Foundation of Korea;Ministry of Science and ICT,South Korea(2021R1G1A1091912)。
We demonstrate monolithically integrated n-GaAs/p-Si depletion-type optical phase shifters fabricated on a 300 mm wafer-scale Si photonics platform.We measured the phase shifter performance using Mach–Zehnder modulat...
the National Natural Science Foundation of China(Grant Nos.61505003 and 61674140);the Beijing Education Commission Project(Grant No.SQKM201610005008);Beijing Postdoctoral Research Foundation(Grant No.2020-Z2-043)。
The room-temperature(RT)bonding mechanisms of Ga As/Si O_(2)/Si and Ga As/Si heterointerfaces fabricated by surface-activated bonding(SAB)are investigated using a focused ion beam(FIB)system,cross-sectional scanning t...
Supported by the Fund of State Key Laboratory of Information Photonics and Optical Communications of Beijing University of Posts and Telecommunications;the National Basic Research Program of China under Grant No 2010CB327601;the Natural Science Foundational Science and Technology Cooperation Projects under Grant No 2011RR000100;the 111 Project of China under Grant No B07005;the Doctoral Program of Higher Specialized Research Fund under Grant No 20130005130001
The growth of GaAs epilayers on silicon substrates with a thin amorphous silicon (a-Si) buffer layer by met- alorganic chemical vapor deposition is investigated in detail. Combining with the two-step growth method, ...
supported by the Fundamental Research Funds for the Central Universities,China(Grant No.2013RC1205);the National Basic Research Program of China(Grant No.2010CB327601)
The growth of GaAs epilayers on silicon substrates with multiple layers of InAs quantum dots(QDs) as dislocation filters by metalorganic chemical vapor deposition(MOCVD) is investigated in detail.The growth condit...
We propose a heterostructure junctionless tunnel field effect transistor (HJL-TFET) using AIGaAs/Si. In the proposed HJL-TFET, low band gap silicon is used in the source side and higher band gap AlGaAs in the drain ...
Supported by the Fundamental Research Funds for the Central University under Grant No 2013RC1205;the National Basic Research Program of China under Grant No 2010CB327602。
To explain different doping effects in a buffer layer,thermally annealed interface,and upper epilayers of GaAs/Si films grown by Metalorganic Chemical Vapor Deposition(MOCVD),the behaviors of unintentional doping in G...