Project supported by the National Defense Advanced Research Project,China(Grant No.315 xxxxx301);National Defense Innovation Program,China(Grant No.48xx4);the National Key Technologies Research and Development Program of China(Grant No.2018YFA03xxx01);the Scientific Instrument Developing Project of the Chinese Academy of Sciences(Grant No.YJKYYQ2017xxx2);the National Natural Science Foundation of China(Grant No.6150xxx6)
The growth of the InAs film directly on the Si substrate deflected from the plane(100) at 4° towards(110) has been performed using a two-step procedure. The effect of the growth and annealing temperature on the elect...