supported by the National Natural Science Foundation of China (No. 60576051);the State Key Development Program for BasicResearch of China (No. 2006CB3027-01)
Thin gate oxide radio frequency (RF) PDSOI nMOSFETs that are suitable for integration with 0.1μm SO1 CMOS technology are fabricated, and the total ionizing dose radiation responses of the nMOSFETs having four diffe...
the National Natural Science Foundation of China(No.60576051);the State Key Development Program for Basic Research of China(No.2006CB3027-01)~~
0.5μm-gate-length lateral double-diffused metal-oxide-semiconductor field-effect transistors (LDMOSFETs) with low barrier body contact (LBBC) and body tied to the source (BTS) were fabricated on silicon-on-insu...
National Nature Science Foundation of China(No.60576051)~~
The effects of total ionizing dose radiation on direct current (DC) and small-signal radio frequency (RF) performance of multi-finger RF partial deplete silicon-on-insulator lateral double diffused MOS (PDSOI LD...
This paper presents the fabrication and performance of a 0.18μm nMOSFET for RF applications. This device features a nitrided oxide/poly-silicon gate stack, a lightly-doped-drain source/drain extension, a retrograde c...