supported by the National Natural Science Foundation of China(Grant No.60025409 and No.50472068);supported by the National High-Tech Research and Development Program of China(863 Program,Grant No.2001AA311080).
The surface polishing for silicon carbide (SIC) substrates was investigated and results were presented for mechanical polishing (MP) and chemo-mechanical polishing (CMP). High quality surfaces were obtained afte...
This work was supported by the National Natural Science Foundation of China (Grant No. 60025409 and 50472068);It was also supported by National "863" High Technology Plan (Grant No. 2001AA311080).
Three main machining processes of large-diameter 6H-SiC wafers were introduced in this paper. These processes include cutting, lapping and polishing. Lapping causes great residual stresses and deep damage layer which ...
Project supported by the National Natural Science Foundation of China(60025409 and 50472068);National"863"High Technology Plan(2001AA311080)
SiC substrates grown by the sublimation method still have high densities of structural defects such as dislocations,micropipes,low-angle grain boundaries,macrodefects and polytypes.Wet etching was effectively used to ...
Project supproted by the National Natural Science Foundation of China(60025409 and 50472068);National"863"High Technology Plan(2001AA311080);Program for New Century Excellent Talents in Shangdong University
Under electron beam irradiation,the in-situ formation of 2H-SiC dentritic nanocrystals from amorphous silicon carbide at room temperature was observed.The homogenous transition mainly occurs at the thin edge and on th...
Project supported National Natural Science Foundation of China(60025409 and 50472068);National"863"High Technology Plan(2001AA311080)
High-resolution X-ray diffractometry(HRXRD)was used to assess the quality of 6H-SiC crystals grown by sublimation method.The results show the occurrence of low-angle grain boundaries(LB)is close relative to the inclin...