Funded by the National Natural Science Foundation of China (NSFC, No. 60376019)
HfTiN film was deposited by co-reactive sputtering and then was annealed in dif-ferent gas ambients at temperature of 650 ℃ for 2 min to form HfTiON film. Capacitance-voltage and gate-leakage characteristics were inv...
Supported by the National Natural Science Foundation of China (60376019)
This paper takes full advantages of the I-V transconductance characteristics of metal-oxide semiconductor field effect transistor (MOSFET) operating in the subthreshold region and the enhancement pre-regulator techn...