supported by National Key R&D Program of China(Grant No.2023YFB4403700);National Natural Science Foundation of China(Grant No.62274032);Fundamental Research Funds for Central Universities(Grant No.2242022R40010);Natural Science Foundation of Jiangsu Province(Grant Nos.BK20231150,BK20232006);Distinguished Young Scientists Foundation of Jiangsu Province(Grant No.BK20230025);Technological Achievements of Jiangsu Province(Grant No.BA2022005);Key Research Program of Jiangsu Province(Grant No.BE2022058-3).
The drain current(ID)of the n-channel GaN field-effecttransistor(n-FET)is influenced by the substrate-to-source bias voltage(VBS)(substrate bias effect)[1].Actually,nonzero VBS is also likely to occur in p-FET in real...
supported by the National Natural Science Foundation of China(62104185);the National Science Fund for Distinguished Young Scholars(61925404);the Fundamental Research Funds for the Central Universities;the Innovation Fund of Xidian University;the Wuhu and Xidian University Special Fund for Industry-University-Research Cooperation(XWYCXY-012021010)。
Pre-ohmic-annealing(POA)treatment of P-GaN/AlN/AlGaN epitaxy under N_(2)atmosphere was demonstrated to effectively achieve good p-type ohmic contact as well as decreased epitaxy sheet resistance.Ohmic contact resistan...
supported in part by the National Key Research and Development Program of China under Grant2022YFB3604400;in part by the Youth Innovation Promotion Association of Chinese Academy Sciences(CAS);in part by CAS-Croucher Funding Scheme under Grant CAS22801;in part by National Natural Science Foundation of China under Grant 62334012,Grant 62074161,Grant 62004213,Grant U20A20208;Grant 62304252;in part by the Beijing Municipal Science and Technology Commission project under Grant Z201100008420009 and Grant Z211100007921018;in part by the University of CAS;in part by IMECAS-HKUST-Joint Laboratory of Microelectronics。
In this study,we present the development of self-aligned p-channel Ga N back gate injection transistors(SA-BGITs)that exhibit a high ON-state current.This achievement is primarily attributed to the conductivity modula...
supported by Hunan Provincial Natural Science Foundation of China(Grant No.2024JJ6157);Natural Science Foundation of Changsha(Grant No.kq2208213);National Natural Science Foundation of China(Grant No.62122084);Education Department of Hunan Province(Grant No.22B0020);Synergetic Extreme Condition User Facility(Grant No.2024-SECUF-PT-001871);Fundamental Research Funds for the Central Universities(Grant No.531118010804)。
GaN outperforms silicon in applications with high power and high frequency owing to the high critical electric field and high electron mobility.However,the hole-based GaN transistors which are pivotal to the GaN-based...
Project supported by the Key-Area Research and Development Program of Guangdong Province,China(Grant Nos.2020B010174001 and 2020B010171002);the Ningbo Science and Technology Innovation Program 2025(Grant No.2019B10123);the National Natural Science Foundation of China(Grant No.62074122).
The threshold voltage(V_(th))of the p-channel metal-oxide-semiconductor field-effect transistors(MOSFETs)is investigated via Silvaco-Atlas simulations.The main factors which influence the threshold voltage of p-channe...
In this paper,the reliability of sense-switch p-channel flash is evaluated extensively.The endurance result indicates that the p-channel flash could be programmed and erased for more than 10000 cycles;the room tempera...
supported by National Key Research and Development Project(Grant Nos.2018YFB2200500,2018YFB2202800);National Natural Science Foundation of China(Grant Nos.61534004,61604112,61622405,61874081,61851406)。
Dear editor,Over the past decade,germanium has attracted great interest as a promising channel material for p-channel metal oxide semiconductor field-effect-transistor(MOSFET),owing to its higher hole mobility over Si...
supported by National Natural Science Foundation of China(Grant Nos.61404005,61674008,61421005);National High Technology Research and Development Program of China(863)(Grant No.2015AA016501)
In this paper, self-heating effects(SHE) in nanoscale Ge p-channel Fin FETs with Si substrate are evaluated by TCAD simulation. Hydrodynamic transport with modified mobilities and Fourier′s law of heat conduction w...
Acknowledgements This work was supported by the National Natural Science Foundation of China (Nos. 51672154, 51372130, and 61401251), Open Research Fund Program of the State Key Laboratory of Low-Dimensional Quantum Physics (No. KF201517), and Open Foundation of State Key Laboratory of Electronic Thin Films and Integrated Devices (No. KFJJ201402).
Heterogeneous complementary inverters composed of bi-layer molybdenum disulfide (MoS2) and single-walled carbon-nanotube (SWCNT) networks are designed, and n-type MoS2/p-type SWCNT inverters are fabricated with a ...
supported by the National Natural Science Foundation of China(Grant No.61404110);the National Higher-Education Institution General Research and Development Project,China(Grant No.2682014CX097)
A novel structure is proposed for doubling the vertical breakdown voltage of silicon-on-insulator(SOI) devices. In this new structure, the conventional buried oxide(BOX) in an SOI device is split into two sections...