Project supported by the National Natural Science Foundation of China(Nos.61474101,61106130);the Natural Science Foundation of Jiangsu Province of China(No.BK20131072)
A high-performance enhancement-mode (E-mode) gallium nitride (GaN)-based metal-insulator- semiconductor high electron mobility transistor (MIS-HEMT) that employs a 5-nm-thick aluminum gallium nitride (Al0.3Ga0...
GaN metal-oxide-semiconductor field-effect transistors (MOSFETs) on AIGaN/GaN heterostructure with a recess gate were fabricated and characterized. The device showed good pinch-off characteristics and a maximum fiel...
financially supported by the National Natural Science Foundation of China (Nos. 60406004, 60890193, and 60736033);the National Key Micrometer/Nanometer Processing Laboratory
In this article, a detailed analysis of the wet- etching technique for AIGaN/GaN heterostructure using dry thermal oxidation followed by a wet alkali etching was performed. The experimental results show that the oxida...
supported in part by the Grainger Center for Electric Machinery and Electromechanics of the University of Illinois
We theoretically present the intrinsic limits to electron mobility in the modulation-doped AIGaN/GaN two-dimensional electron gas (2DEG) due to effects including acoustic deformation potential (DP) scattering, pie...
Project supported by the National Natural Science Foundation of China(Grant Nos.11174008 and 61361166007);the National Basic Research Program of China(Grant Nos.2012CB619306 and 2012CB619301);the Research Fund for the Doctoral Program of Higher Education of China(Grant No.20100001120012)
Epitaxial evolution of buried cracks in a strain-controlled AIN/GaN superlattice interlayer (IL) grown on GaN tem- plate, resulting in crack-free AIGaN/GaN multiple quantum wells (MQW), was investigated. The proce...
A phenomenological low-filed mobility model is developed to describe the dependence ot the carrier molgmty on me gate to source bias applied for AIGaN/GaN high electron mobility transistor. The results show excellent ...
Project supported by the Program for New Century Excellent Talents in University,China(Grant No.NCET-12-0915);the National Natural Science Foundation of China(Grant No.61204085)
In this paper, the influence of a drain field plate (FP) on the forward blocking characteristics of an AlGaN/GaN high electron mobility transistor (HEMT) is investigated. The HEMT with only a gate FP is optimized,...
Project supported by the National Basic Research Program of China (Grant Nos. 2012CB619302 and 2010CB923204);the National Natural Science Foundation of China (Grant Nos. 60976042, 51002058, and 11104150);the China Postdoctoral Science Foundation (Grant No. 20100480064)
The effects of polarization and related structural parameters on the intersubband transitions of A1GaN/GaN multi- quantum wells (MQWs) have been investigated by solving the Schr6dinger and the Poisson equations self...
supported by the State Key Program and Major Program of National Natural Science Foundation of China (Grant Nos. 60736033 and 60890191);the Fundamental Research Funds for the Central Universities (Grant No. JY10000925002)
AlGaN/GaN metal-insulator-semiconductor high electron-mobility transistors (MIS-HEMTs) with atomic layer deposited (ALD) NbA10 gate dielectric were investigated using 3 MeV proton irradiation at a fluence of 1015 ...