Supported by the National Basic Research Program of China under Grant No 2011CBA00605;the National Natural Science Foundation of China under Grant No 61404165
Strained-Si0.73Ge0.27 channels are successfully integrated with high-R/metal gates in p-type metai-oxide- semi- conductor field effect transistors (pMOSFETs) using the replacement post-gate process. A silicon cap an...
the National Basic Research Program of China(Grant Nos.2011CBA00605 and 2010CB327501);the National Natural Science Foundation of China(Grant No.61106095);the National Science and Technology Major Project of the Ministry of Science and Technology of China(Grant No.2011ZX02708-003)
In0.4Ga0.6As channel metal-oxide-semiconductor field-effect transistors (MOSFETs) with and without an Si-doped In0.49Ga0.51P barrier layer grown on semi-insulating GaAs substrates have been investigated for the firs...
Project supported by the National Basic Research Program (973) of China (No. 2010CB327403);the National Natural Science Foundation of China (Nos. 61001066 and 61102027)
This paper proposes an efficient PSP-based model for cross-coupled metal-oxide-semiconductor field-effect transistors(MOSFETs) with optimized layout in the voltage controlled oscillator(VCO).The model employs a PSP ch...
Project supported by the National Natural Science Foundation of China (Grant No. 60606013);the National Basic Research Program of China (Grant No. 2006CB302705)
Interface roughness strongly influences the performance of germanium metal-organic-semiconductor field effect transistors (MOSFETs). In this paper, a 2D full-band Monte Carlo simulator is used to study the impact of...
Supported by the National Basic Research Program of China under Grant No G2009CB929300, and the National Natural Science Foundation of China under Grant Nos 60521001 and 60776061.
Using self-consistent calculations of million-atom SchrSdinger-Poisson equations, we investigate the I-V characteristics of tunnelling and ballistic transport of nanometer metal oxide semiconductor field effect transi...
The effects of several factors on mobility in 4H-SiC buried-channel (BC) MOSFETs are studied,A simple model that gives a quantitative analysis of series resistance effects on the effective mobility and field-effect ...
To overcome the floating-body effect and self-heating effect of SOI devices,the drain and source on insulator (DSOI) structure is fabricated and tested.The low dose developed recently and low energy local SIMOX techno...
The MOSFET gate currents of high k gate dielectrics due to direct tunneling are investigated by using a new direct tunneling current model developed.The model includes both the inversion layer quantization effect with...
The short-channel performance of typical 70nm MOSFETs with high K gate dielectric is widely studied by using a two dimensional(2-D) device simulator.The short-channel performance is degraded from the fringing field a...