financially supported by the National Natural Science Foundation of China (Nos. 60406004, 60890193, and 60736033);the National Key Micrometer/Nanometer Processing Laboratory
In this article, a detailed analysis of the wet- etching technique for AIGaN/GaN heterostructure using dry thermal oxidation followed by a wet alkali etching was performed. The experimental results show that the oxida...
supported by the National Natural Science Foundation of China(60736033 and 60676048)
As a promising group III-nitride semiconductor material,InAlN ternary alloy has been attracted increasing interest and widespread research efforts for optoelectronic and electronic applications in the last 5 years.Fol...
supported by the National Natural Science Foundation of China(Nos.60406004,60890193,60736033);the National Key Micrometer/Nanometer Processing Lab
Semi-on DC stress experiments were conducted on A1GaN/GaN high electron mobility transistors (HEMTs) to find the degradation mechanisms during stress. A positive shift in threshold voltage (VT) and an increase in ...
supported by the National Natural Science Foundation of China(Nos.60406004,60890193,60736033);the National Key Micrometer/Nanometer Processing Laboratory,China
A novel wet etching method for AlGaN/GaN heterojunction structures is proposed using thermal oxidation f ollowed by wet etching in KOH solution.It is found that an AlGaN/GaN heterostructure after high temperature oxid...
Project supported by the Fundamental Research Funds for the Central Universities,China (Grant No. K50511250002);the National Key Science & Technology Special Project,China (Grant No. 2008ZX01002-002);the Major Program and State Key Program of the National Natural Science Foundation of China (Grant Nos. 60890191 and 60736033);the Science Fund for Youths Scholars (Grant Nos. 61204006)
In this paper,Raman shifts of a-plane GaN layers grown on r-plane sapphire substrates by low-pressure metal-organic chemical vapor deposition(LPMOCVD) are investigated.We compare the crystal qualities and study the ...
Project supported by the National Key Science & Technology Special Project,China(Grant No.2008ZX01002-002);the Fundamental Research Funds for the Central Universities,China(Grant No.JY10000904009);the Major Program and State Key Program of the National Natural Science Foundation of China(Grant Nos.60890191 and 60736033)
In this paper we report that the GaN thin film is grown by metal-organic chemical vapour deposition on a sapphire (0001) substrate with double A1N buffer layers. The buffer layer consists of a low-temperature (LT)...
supported by the National Key Science and Technology Special Project,China(Grant No.2008ZX01002-002);the Major Program and State Key Program of the National Natural Science Foundation of China(Grant Nos.60890191 and 60736033);the Fundamental Research Funds for the Central Universities,China(Grant No. JY10000904009)
In this study,the thick AlGaN epilayers have been grown on the c-plane sapphire substrate and the free-standing GaN substrate using low-temperature AlN nucleation layers by low-pressure metal-organic chemical vapor de...
Project supported by the Key Program of the National Natural Science Foundation of China(No.60736033)
Recently there has been a rapid domestic development in group iII nitride semiconductor electronic materials and devices. This paper reviews the important progress in GaN-based wide bandgap microelectronic materials a...
Project supported by the Fundamental Research Funds for the Central Universities,China (Grant No. K50511250002);the National Key Science and Technology Special Project,China (Grant No. 2008ZX01002-002);the National Natural Science Foundation of China (Grant Nos. 60736033,60976068,and 61076097)
We report on the growth of the high-quality GaN grain on a r-plane sapphire substrate by using a self-organized SiN interlayer as a selective growth mask. Transmission electron microscopy, scanning electron microscopy...
Project supported by the National Key Science & Technology Special Project,China(No.2008ZX01002-002);the Major Program and State Key Program of National Natural Science Foundation of China(Nos.60890191,60736033);the Fundamental Research Funds for the Central Universities,China(Nos.K50510250003,K50510250006)
AlGaN/GaN HEMTs with 0.2μm V-gate recesses were developed.The 0.2μm recess lengths were shrunk from the 0.6μm designed gate footprint length after isotropic SiN deposition and anisotropic recessed gate dry etching....