Project supported by the Major Program of the National Natural Science Foundation of China (Grant No 50390060);the National Natural Science Foundation of China (Grant Nos 60576022 and 50572012)
This paper reports that amorphous silicon nitride (a-SiNx) overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 nm a-SiNs overcoat has better anti-corr...