supported by the National High Technology Research and Development Program of China(Grant No.2011AA050401);the National Science Fundfor Distinguished Young Scholars,China(Grant No.51225701)
We present the design consideration and fabrication of 4H-SiC trenched-and-implanted vertical junction field-effect transistors (TI-VJFETs). Different design factors, including channel width, channel doping, and mes...
supported by the National High Technology Research and Development Program of China(No.2011AA050401);the Project of State Grid Corporation of China(No.SGRIDGKJ[2013]210)
This paper presents the design and fabrication of an effective, robust and process-tolerant floating guard ring termination on high voltage 4H-SiC PiN diodes. Different design factors were studied by numerical simulat...