A novel flash memory cell with stacked structure (Si substrate/SiGe quantum dots/tunneling oxide/polySi floating gate) is proposed and demonstrated to achieve enhanced F-N tunneling for both programming and erasing....
This project is financially supported by the National Natural Science Foundation of China(No.10075029 and 69836020);National“863”Advanced Research Project of China(No.2002AA3Z1230).
The change of electrical performances of 1 MeV electron irradiated silicon-germanium (SiGe) heterojunction bipolar transistor (HBT) and Si bipolar junction transistor (BJT) was studied. After electron irradiation, bot...
A new 125mm UHV/CVD SiGe/Si epitaxy equipment SGE500 capable of commercialization is constructed and device-level SiGe HBT material is grown.A polysilicon emitter (PolyE) double mesa microwave power SiGe HBT showing e...