This research was supported by the National Key R&D Program of China(Grant No.2022YFB3606900);in part by the National Natural Science of China(Grant No.62004217).
The detrimental effect of imprint,which can cause misreading problem,has hindered the application of ferroelectric HfO_(2).In this work,we present results of a comprehensive reliability evaluation of Hf_(0.5)Zr_(0.5)O...
supported by National Key Research and Development Project(Grant No.2018YFB2200500);National Natural Science Foundation of China(Grant Nos.62025402,62090033,91964202,92064003,61874081,62004149);Key Research Project of Zhejiang Lab(Grant No.2021MD0AC01)。
Since the initial report of HfO2-based ferroelectric films in 2011,great attention has been paid to ferroelectric field-effect transistors and ferroelectric random-access memories(FeRAMs)[1–3].Up to now,many efforts ...
the Singapore National Research Foundation under CRP Award No.NRF-CRP10-2012-02.
Ferroelectric random access memory(FeRAM)based on conventional ferroelectric perovskites,such as Pb(Zr,Ti)O_(3)and SrBi_(2)T_(2)O_(9),has encountered bottlenecks on memory density and cost,because those conventional p...
Although conventional Floating gate (FG) flash memory has recently gone into the 2X nm node, the technology challenges are formidable below 20 nm. Charge-trapping (CT) devices are promising to scale beyond 20 nm b...
Supported by the National Natural Science Foundation of China (Grant No. 60601003);Ying Tong Education Foundation (Grant No. 101063);International Cooperation Project from Ministry of Science and Technology of China (Grant No. 2008DFA12000)
BiFeO3/PZT multilayer capacitor was prepared on Pt(100)/Ti/SiO2/Si(100) substrate. PZT buffer layer was derived by MOCVD method (label: PZT1) and sputtering method (label: PZT2) respectively. XRD analysis indicated th...