Supported by the National Natural Science Foundation of China(Grant No.61904207);scientific research support foundation for introduced high-level talents of Shenyang Ligong University(Grant No.1010147000914);the Natural Science Foundation of Sichuan Province,China(Grant No.2022NSFSC0886)
AlGaN/GaN heterojunction field-effect transistors(HFETs)with p-GaN cap layer are developed for normally-off operation,in which an in-situ grown AlN layer is utilized as the gate insulator.Compared with the SiNxgate in...