supported in part by National Natural Science Foundation of China(Grant Nos.60976068,60936005);Cultivation Fund of the Key Scientific and Technical Innovation Project,Ministry of Education of China Program(Grant No.708083)
Electrostatic-discharge (ESD) protection design is one of the key challenges of advanced CMOS processes. RC-triggered and MOSFET-based power supply ESD clamp circuits have been widely used to ob- tain the desired ES...
为了进一步提高深亚微米SOI(Silicon-On-Insulator)MOSFET(Metal-Oxide Semiconductor Field Effect Transistor)的电流驱动能力,抑制短沟道效应和漏致势垒降低效应,提出了非对称Halo异质栅应变Si SOI MOSFET.在沟道源端一侧引入高掺杂H...
supported by the National Natural Science Foundation of China (Grant Nos. 61076097,60936005);in part by Cultivation Fund of the Key Scientific and Technical Innovation Project,Ministry of Education of China Program (Grant No. 20110203110012)
A new low leakage 3×VDD-tolerant electrostatic discharge(ESD)detection circuit using only low-voltage device without deep N-well is proposed in a standard 90-nm 1.2-V CMOS process.Stacked-transistors technique is ado...
Project supported by the National Natural Science Foundation of China(Nos.61076097,60936005);the Cultivation Fund of the Key Scientific and Technical Innovation Project,Ministry of Education of China Program(No.20110203110012)
An electrostatic discharge (ESD) detection circuit with a modified RC network for a 90-nm process clamp circuit is proposed. The leakage current is reduced to 4.6 nA at 25 ℃. Under the ESD event, it injects a 38.7 ...
supported by the National Natural Science Foundation of China(Nos.60976068,60936005);the Cultivation Fund of the Key Scientific and Technical Innovation Project,Ministry of Education of China(No.708083)
A MOSFET-based electrostatic discharge (ESD) power clamp circuit with only a 10 ns RC time constant for a 0.18-μm process is proposed. A diode-connected NMOSFET is used to maintain a long delay time and save area. ...
supported by the State Key Fundamental Research Project of China(Grant No.2011CBA00606);the National Natural Science Foundation of China(Grant No.60936005);the Peking University Cultivation Fund(Grant No.PKU-PY2009-011)
The gate leakage current and reliability concern become more serious due to the aggressive scaling-down of the gate oxide thickness. Developing advanced gate dielectrics process for mass production is essential in Chi...