We report on a GaN metal-oxide-semiconductor high electron mobility transistor (MOS-HEMT) using atomic-layer deposited (ALD) A1203 as the gate dielectric. Through decreasing the thickness of the gate oxide to 3.5n...
This work was supported by the National Key Basic Research and Development Program(Grant No.51327020301);the National Defense Key Pre-Research.Program(Grant No.41308060106)
The effects of strain relaxation of AlGaN barrier layer on the conduction band profile,electron concentration and two-dimensional gas(2DEG)sheet charge density in a high Al-content AlGaN/GaN high electron mobility tra...