supported by the State Key Development Programfor Basic Research of China(No.2002CB311903);the Key Innovation Program of the Chinese Academy of Sciences(No.KGCX2-S W-107)~~
This paper focuses on how to reduce the gate leakage current caused by plasma dry etching. X-ray photoelectron spectroscopy (XPS) is employed to measure the AlGaN surface before and after etching. N vacancies are in...